BS EN 62047-18:2013 PDF
Semiconductor devices. Micro-electromechanical devices - Bend testing methods of thin film materials
Semiconductor devices. Micro-electromechanical devices - Bend testing methods of thin film materials
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Дата публикации:
- 31 октября 2013 г.
- ICS:
- 31.080.99
- Технический комитет:
- CENELEC
- SKU:
- BS EN 62047-18:2013
Abstract
1 Scope This part of IEC 62047 specifies the method for bend testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 μm and 10 μm. Thin films are used as main structural materials for Micro-electromechanical Systems (abbreviated as MEMS in this document) and micromachines. The main structural materials for MEMS, micromachines, etc., have special features, such as a few micron meter size, material fabrication by deposition, photolithography, and/ or non-mechanical machining test piece. This International Standard specifies the bend testing and test piece shape for micro-sized smooth cantilever type test pieces, which enables a guarantee of accuracy corresponding to the special features.
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