ASTM F1526-95(2000)
Standard Test Method for Measuring Surface Metal Contamination on Silicon Wafers by Total Reflection X-Ray Fluorescence Spectroscopy (Withdrawn 2003)
Standard Test Method for Measuring Surface Metal Contamination on Silicon Wafers by Total Reflection X-Ray Fluorescence Spectroscopy (Withdrawn 2003)
- Статус документа:
- Отменён
- Формат:
- Электронный (PDF)
- Дата публикации:
- 16 августа 2017 г.
- SKU:
- ASTM F1526-95(2000)
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Abstract
ScopeThis standard was transferred to SEMI (www.semi.org) May 20031.1 This test method covers the quantitative determination of elemental areal density on the surface of polished single crystal silicon substrates using total reflection X-ra...
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