IEC 62047-52:2026
Semiconductor devices - Micro-electromechanical devices - Part 52: Biaxial tensile testing method for stretchable MEMS
Semiconductor devices - Micro-electromechanical devices - Part 52: Biaxial tensile testing method for stretchable MEMS
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Количество страниц:
- 12
- Дата публикации:
- 4 марта 2026 г.
- Издание:
- IEC IS 62047 edition 1 version 1
- ICS:
- 31.080.99
IEC 62047-52:2026 specifies a testing method for measuring device performance and failure strain under biaxial tensile deformation in stretchable MEMS materials. The typical examples of the stretchable MEMS materials are flexible single crystalline silicon structures, MEMS circuit boards, interconnected MEMS on a stretchable substrate. The test piece has a cruciform geometry and the test piece thickness ranges from 1 μm to 100 μm with the same thickness as the actual devices. Since the failure strain can vary depending on loading conditions like uniaxial tension and equi-biaxial tension, a biaxial load is applied to a cruciform test piece with varying strain ratio between two perpendicular loading directions.
Abstract
Overview
IEC 62047-52:2026 provides a standardized biaxial tensile testing method for evaluating the mechanical performance and failure strain of stretchable micro-electromechanical systems (MEMS) materials and devices. Developed by the International Electrotechnical Commission (IEC), this standard addresses the unique demands of characterizing flexible electronics and MEMS on stretchable substrates, such as flexible silicon structures and interconnected MEMS circuit boards. The procedure employs a cruciform-shaped test piece, mirroring actual device thicknesses from 1 μm to 100 μm, and applies biaxial loads in two perpendicular directions, allowing for realistic assessment under working conditions where uniaxial methods may not suffice.
Key Topics
- Biaxial Tensile Test Methodology: The standard specifies the application of controlled biaxial tensile stress to a cruciform test piece, simulating operational strains experienced by flexible MEMS devices.
- Device Performance Measurement: Detailed guidelines ensure consistent measurement of mechanical deformation, failure strain, and device functionality during stretching.
- Cruciform Test Piece Geometry: Ensures that the stress distribution and device response accurately reflect real device configurations. Strict dimensional requirements and measurement protocols are mandated.
- Test Apparatus and Procedure:
- Use of load cells, optical microscopy, and CCD cameras for real-time strain and failure monitoring.
- In-operando electrical measurements to detect failures through electrical signal changes.
- Environmental controls for temperature and humidity to ensure reliable results.
- Test Reporting: Includes requirements for thorough documentation of preparation, testing conditions, and outcome, vital for interlaboratory comparability and reproducibility.
Applications
The standardized biaxial tensile testing outlined in IEC 62047-52:2026 is essential for:
- Flexible MEMS Device Development: Evaluating mechanical reliability and identifying operational limits of stretchable silicon devices, MEMS-based sensors, and flexible electronic circuits.
- Material Qualification: Assessing new stretchable substrate materials or device architectures for suitability in wearable technology, biomedical sensors, soft robotics, and foldable or stretchable electronic products.
- Quality Assurance: Ensuring manufactured MEMS devices meet mechanical specifications under real-world deformation modes.
- Research and Development: Providing reliable and reproducible data for academic and industrial research involving stretchable MEMS, including the study of micro-patterned flexible electronics such as kirigami-structured substrates.
Related Standards
For comprehensive mechanical characterization and testing of MEMS and thin-film materials, consider these related standards:
- IEC 62047-2:2006 - Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials.
- IEC 62047-3:2006 - Semiconductor devices - Micro-electromechanical devices - Part 3: Thin film standard test piece for tensile testing.
- ISO 16842:2021 - Metallic materials - Sheet and strip - Biaxial tensile testing method using a cruciform test piece.
These references provide complementary guidance for uniaxial tensile testing and thin-film standardization, supporting laboratory best practices in the evaluation of stretchable semiconductor materials and MEMS device reliability.
Keywords: IEC 62047-52:2026, biaxial tensile testing, stretchable MEMS, micro-electromechanical devices, flexible electronics, silicon structures, cruciform test piece, MEMS reliability, mechanical testing standard, device failure strain, IEC standards
Технические детали
- Технический комитет
- SC 47F - Micro-electromechanical systems
- SKU
- IEC 62047-52:2026
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IEC 62047-2:2006
ДействующийSemiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materia…
Overview The IEC 62047-2:2006 standard, published by the International Electrotechnical Commission (IEC), specifies the method for tensile testing of thin film materials used primarily in micro-elect…
IEC 62047-3:2006
ДействующийSemiconductor devices - Micro-electromechanical devices - Part 3: Thin film standard test piece for tensile t…
Overview IEC 62047-3:2006 is an international standard published by the International Electrotechnical Commission (IEC) that specifies requirements for a standard test piece used in tensile testing o…
ISO 16842:2021
ДействующийMetallic materials — Sheet and strip — Biaxial tensile testing method using a cruciform test piece
Overview ISO 16842:2021 specifies a standardized biaxial tensile testing method using a cruciform test piece to measure the biaxial stress–strain behavior of sheet and strip metallic materials. The s…