ISO 22493:2014
Microbeam analysis — Scanning electron microscopy — Vocabulary
Microbeam analysis — Scanning electron microscopy — Vocabulary
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Количество страниц:
- 20
- Дата публикации:
- 9 апреля 2014 г.
- Издание:
- ISO IS 22493 edition 2 version 1
- ICS:
- 01.040.37
ISO 22493:2014 defines terms used in the practice of scanning electron microscopy (SEM). It covers both general and specific concepts, classified according to their hierarchy in a systematic order, with those terms that have already been defined in ISO 23833 also included, where appropriate. ISO 22493:2014is applicable to all standardization documents relevant to the practice of SEM. In addition, some clauses of ISO 22493:2014 are applicable to documents relevant to related fields (e.g. EPMA, AEM, EDS) for the definition of terms which are relevant to such fields.
Abstract
Overview
ISO 22493:2014 - Microbeam analysis - Scanning electron microscopy - Vocabulary defines the standardized terminology used in the practice of scanning electron microscopy (SEM). Published by ISO/TC 202 (Microbeam analysis), this second edition provides a systematic, hierarchical set of terms covering the physical basis of SEM, instrumentation, image formation and processing, image interpretation and analysis, and measurement/calibration of magnification and resolution. The standard is intended to ensure consistent SEM vocabulary across standards, technical documents, laboratory procedures, training materials and procurement specifications.
Key Topics
ISO 22493:2014 organizes and defines terms that underpin SEM practice. Representative technical topics and entries include:
- Physical basis of SEM: electron optics, electron emission (field emission, thermionic emission), electron scattering (elastic/inelastic), backscattered electrons (BSE) and secondary electrons (SE) (convention: BSE > 50 eV; SE < 50 eV).
- Instrumentation: electron gun types (field-emission gun, thermionic gun), brightness and reduced brightness, emission current, electron lens system, aberrations (chromatic, spherical), apertures and aperture diffraction.
- Image formation and analysis: interaction volume, information volume, electron penetration and range, Monte Carlo simulation for probe–sample interaction, contrast mechanisms, and EBSD/EBIC phenomena.
- Measurement and calibration: terms relevant to magnification, resolution and calibration of SEM images.
- Abbreviations and cross-references: EDS, EPMA, AEM, ESEM, BSE, SE, EBSD, etc.
The standard classifies terms according to hierarchy and includes definitions from ISO 23833 where appropriate, supporting consistent cross‑standard terminology.
Applications and Who Uses It
ISO 22493:2014 is a reference for anyone who writes, uses or specifies SEM-related documentation:
- SEM instrument manufacturers and software developers (for user manuals, specs and UI labeling)
- Materials scientists, metallurgists, geologists, biologists and environmental analysts using SEM for characterization
- Calibration and metrology laboratories implementing reproducible measurement and reporting
- Standards writers, quality managers and procurement specialists drafting test methods, acceptance criteria and contracts
- Educators and trainers creating curricula and glossaries for SEM operation and analysis
Using the standard improves clarity in reports, facilitates interoperability of methods (EPMA, AEM, EDS) and reduces ambiguity in multi-disciplinary projects.
Related Standards
- ISO 23833 (referenced for previously defined SEM terms)
- Other ISO/TC 202 microbeam analysis standards (EPMA, AEM, EDS terminology and methods)
Keywords: ISO 22493:2014, scanning electron microscopy, SEM vocabulary, microbeam analysis, SEM terminology, backscattered electron, secondary electron, electron optics, Monte Carlo simulation, EPMA, EDS.
Технические детали
- Технический комитет
- ISO/TC 202/SC 1 - Terminology
- SKU
- ISO 22493:2014
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