ISO 13424:2013 PDF
Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis
Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Количество страниц:
- 46
- Дата публикации:
- 23 сентября 2013 г.
- Издание:
- ISO IS 13424 edition 1 version 1
- ICS:
- 71.040.40
ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.
Abstract
Overview
ISO 13424:2013 - Surface chemical analysis - X‑ray photoelectron spectroscopy - Reporting of results of thin‑film analysis defines the minimum information required when reporting XPS analyses of thin films on substrates. The standard covers measurement and reporting of chemical composition and film thickness, and of composition‑vs‑depth for inhomogeneous films using techniques such as angle‑resolved XPS (ARXPS), peak‑shape analysis, variable photon energy XPS, and XPS with sputter‑depth profiling.
Key practical points in the standard:
- Methods apply when total film thickness is less than about three times the mean escape depth (MED) of detected photoelectrons (MED commonly
Технические детали
- Технический комитет
- ISO/TC 201/SC 7 - Electron spectroscopies
- SKU
- ISO 13424:2013
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