ISO 14606:2000 PDF
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
- Статус документа:
- Отменён
- Формат:
- Электронный (PDF)
- Количество страниц:
- 15
- Дата публикации:
- 5 октября 2000 г.
- Издание:
- ISO IS 14606 edition 1 version 1
- ICS:
- 71.040.40
L'ISO 14606:2000 donne des lignes directrices sur l'optimisation des paramètres de profilage en profondeur par pulvérisation à l'aide de matériaux mono- et multicouches de référence appropriés afin d'atteindre une résolution en profondeur optimale en fonction des paramètres de l'instrument en spectroscopie des électrons Auger, en spectroscopie de photoélectrons par rayons X et en spectrométrie de masse des ions secondaires. L'ISO 14606:2000 n'est pas prévue pour couvrir l'utilisation de systèmes multicouches spéciaux tels que des couches dopées delta.
Технические детали
- Технический комитет
- ISO/TC 201/SC 4 - Depth profiling
- SKU
- ISO 14606:2000
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