ISO 14606:2015 PDF
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
- Статус документа:
- Отменён
- Формат:
- Электронный (PDF)
- Количество страниц:
- 16
- Дата публикации:
- 1 декабря 2015 г.
- Издание:
- ISO IS 14606 edition 2 version 1
- ICS:
- 71.040.40
ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.
Технические детали
- Технический комитет
- ISO/TC 201/SC 4 - Depth profiling
- SKU
- ISO 14606:2015
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