ISO 14606:2022 PDF

Name: ISO 14606:2022 — Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
SKU: ISO 14606:2022
Price: 25 EUR
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Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

Название (английский):

ISO 14606:2022

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

Статус документа:: Действующий
Формат:: Электронный (PDF)
Количество страниц:: 17
Дата публикации:: 21 ноября 2022 г.
Издание:: ISO IS 14606 edition 3 version 1
ICS:: 71.040.40

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Описание (английский):

This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.

Abstract

Похожие стандарты

Упомянутые в описании и другие стандарты ISO

Overview

ISO 14606:2022 - "Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials" provides guidance and requirements to optimize sputter depth profiling for surface chemical analysis. It specifies how to use single-layered and multilayered reference materials to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy (AES), X‑ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). The standard is explicit that special multilayer systems such as delta-doped layers are out of scope.

Key topics and requirements

Optimization approach: Use of layered reference systems (single and multilayer) to evaluate and set instrument parameters for best depth resolution.

Instrument families covered: AES, XPS, SIMS - including probing and sputtering parameter considerations for each technique.

Critical parameters:

Probing: electron/photon/primary ion energy, beam/current or source power, analysis area, emission angle.
Sputtering: ion species, ion energy (typical range 0.1–25 keV in the standard), ion beam current (examples 1–10 nA), incidence angle, sputtered area and rastering.

Measurement and metrics:

Determination of average sputtering rate and the depth resolution (Δz) at an ideally sharp interface.
Guidance on measuring depth resolution using layered references, and caveats for SIMS when matrix effects differ.

Procedures and alignment:

Practical procedures to align a sputtered crater with a smaller analysis area (including manufacturer-provided alignment tools).
Stepwise optimization of parameter settings to balance analysis sensitivity versus depth resolution.

Supporting material: Informative annexes on factors influencing depth resolution, typical reference single- and multilayer systems, and uses of multilayered systems.

Applications and users

ISO 14606:2022 is practical for:

Surface analysts and lab technicians performing sputter depth profiling in AES, XPS and SIMS.

Instrument manufacturers validating and demonstrating performance.

Materials scientists and semiconductor engineers characterizing multilayer devices (e.g., optical/heterostructure devices) and coatings.

Quality and metrology labs assessing depth profiling reproducibility and instrument settings.

Practical uses include optimizing ion beam conditions to reduce sputter-induced roughening, evaluating sample drift and crater geometry effects, and choosing suitable reference materials for method development.

Related standards

Normative reference: ISO 18115-1 (Surface chemical analysis - Vocabulary).

Developed by ISO/TC 201 (Surface chemical analysis) - useful alongside other ISO guidance on surface analysis and metrology.

Keywords: ISO 14606:2022, sputter depth profiling, surface chemical analysis, depth resolution, reference materials, AES, XPS, SIMS, ion sputtering.

ISO 14606:2022 PDF

Abstract

Похожие стандарты

Overview

Key topics and requirements

Applications and users

Related standards

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