ISO 14701:2018 PDF
Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Количество страниц:
- 17
- Дата публикации:
- 31 октября 2018 г.
- Издание:
- ISO IS 14701 edition 2 version 1
- ICS:
- 71.040.40
This document specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X-ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that can be restricted to less than a 6° cone semi-angle. For thermal oxides in the range 1 nm to 8 nm thickness, using the best method described in this document, uncertainties, at a 95 % confidence level, could typically be around 2 % and around 1 % at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties.
Abstract
Overview
ISO 14701:2018 - "Surface chemical analysis - X-ray photoelectron spectroscopy - Measurement of silicon oxide thickness" specifies validated X-ray photoelectron spectroscopy (XPS) methods to measure the equivalent thickness of silicon dioxide on (100) and (111) silicon wafer surfaces. The standard targets thin thermal oxides in the 1 nm to 8 nm range and is intended for flat, polished samples analyzed with XPS instruments meeting defined hardware and geometry requirements. Typical achievable uncertainties (95% confidence) are around 2% for the standard method and can be near 1% under optimal conditions.
Key topics and requirements
- Scope and applicability
- Measures oxide thickness as an equivalent SiO2 value for (100) and (111) wafers.
- Applicable only to flat, polished samples and instruments with the specified capabilities.
- Instrument requirements
- X-ray source: Al or Mg.
- Sample stage permitting defined photoelectron emission angles.
- Spectrometer input lens restrictable to **
Технические детали
- Технический комитет
- ISO/TC 201/SC 7 - Electron spectroscopies
- SKU
- ISO 14701:2018
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