ISO 16531:2013 PDF
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
- Статус документа:
- Отменён
- Формат:
- Электронный (PDF)
- Количество страниц:
- 18
- Дата публикации:
- 16 мая 2013 г.
- Издание:
- ISO IS 16531 edition 1 version 1
- ICS:
- 71.040.40
ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.
Технические детали
- Технический комитет
- ISO/TC 201/SC 4 - Depth profiling
- SKU
- ISO 16531:2013