ISO 17470:2014

Name: ISO 17470:2014 — Microbeam analysis — Electron probe microanalysis — Guidelines for qualitative point analysis by wavelength dispersive X-ray spectrometry
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Microbeam analysis — Electron probe microanalysis — Guidelines for qualitative point analysis by wavelength dispersive X-ray spectrometry

Название (английский):

ISO 17470:2014

Microbeam analysis — Electron probe microanalysis — Guidelines for qualitative point analysis by wavelength dispersive X-ray spectrometry

Статус документа:: Действующий
Формат:: Электронный (PDF)
Количество страниц:: 10
Дата публикации:: 6 января 2014 г.
Издание:: ISO IS 17470 edition 2 version 1
ICS:: 71.040.99

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Описание (английский):

ISO 17470:2014 gives guidance for the identification of elements and the investigation of the presence of specific elements within a specific volume (on a μm3 scale) contained in a specimen, by analysing X-ray spectra obtained using wavelength dispersive X-ray spectrometers on an electron probe microanalyser or on a scanning electron microscope.

Abstract

Похожие стандарты

Другие стандарты ISO

Overview

ISO 17470:2014 provides guidance for qualitative point analysis by wavelength dispersive X‑ray spectrometry (WDS/WDX) using an electron probe microanalyser (EPMA) or a scanning electron microscope. The standard focuses on identifying which elements are present within a defined micrometric volume (μm3 scale) by analysing WDX spectra, and on documenting the measurement conditions and identification method to avoid inconsistent or erroneous results.

Key topics and technical requirements

Scope and purpose: Guidance for element identification and investigation of specific elements at micrometric scale using EPMA/WDX.

Apparatus and instrument performance: Ensure correct electron column alignment, stable beam current, suitable accelerating voltage, calibrated spectrometer crystals and X‑ray counters, and appropriate sample surface preparation.

Primary beam settings: Select beam energy above excitation energies but low enough to minimize damage, contamination and detector saturation. For very light elements (Be to F), a primary beam energy of 15 keV or less is recommended to reduce absorption effects.

Spectrometer configuration:

Diffraction crystal selection to maximize peak‑to‑background and resolution while minimizing interferences.
Scanning speed should give sufficient data points per peak (practically, measured peaks should contain at least five data points).
Pulse height analyser discrimination can suppress higher‑order reflections but must be validated with reference materials to avoid loss of signal.

Spectrum analysis and peak recognition:

Use reliable X‑ray line tables or laboratory standards to identify peaks.
Evaluate peaks by FWHM and peak height above background. Peaks exceeding background by 2σ or 3σ correspond to approximate confidence levels of 97.7% and 99.9%, respectively.
Check for higher‑order reflections, overlapping peaks, absorption/fluorescence effects and possible contamination from sample preparation.

Reporting: The standard specifies information to include in a test report; Annex A gives an example (stainless steel).

Applications

Qualitative element identification in microstructures, inclusions, coatings, thin films, ceramics, metals and geological samples.

Failure analysis, contamination/source tracing, quality control and research where spatially resolved elemental presence at the micrometer scale is required.

Validating sample preparation and EPMA/WDS operating procedures for laboratories performing microbeam analysis.

ISO 17470:2014

Abstract

Похожие стандарты

Overview

Key topics and technical requirements

Applications

Who should use this standard

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