IEC 63229:2021 PDF
Semiconductor devices - Classification of defects in gallium nitride epitaxial film on silicon carbide substrate
Semiconductor devices - Classification of defects in gallium nitride epitaxial film on silicon carbide substrate
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Количество страниц:
- 21
- Дата публикации:
- 7 апреля 2021 г.
- Издание:
- IEC IS 63229 edition 1 version 1
- ICS:
- 31.080.99
IEC 63229:2021(E) gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission electron microscope images for these defects. This document covers only defects in as-grown GaN epitaxial film on SiC substrate and does not include defects caused by subsequent processes.
Abstract
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