Overview
ISO 19383:2026 - Atomic layer deposition - Chemical characteristics and related process specifications of atomic layer deposition precursors is an international standard developed by ISO for the atomic layer deposition (ALD) industry. This document establishes the chemical characteristics and process specifications required for ALD precursors, ensuring consistency and high-quality results in thin film deposition technologies. It outlines key parameters such as assay content, metal purity, and anion content, critical for precise and reliable ALD processing in advanced manufacturing fields.
Key Topics
- ALD Precursor Classification: The standard classifies ALD precursors according to their chemical nature, covering both metal and non-metal types. This helps manufacturers and users select the right precursors based on application requirements and material compatibility.
- Assay Content: Defines the methods for determining the quantitative content of a substance in precursors, which is vital for guaranteeing the intended chemical composition.
- Metal Purity: Specifies procedures for evaluating the purity of metal content in precursors, detailing acceptable impurity levels to minimize potential defects in resultant films.
- Anion Content: Sets guidelines for measuring anion impurities, with a focus on halide (especially chlorine) concentrations that could impact device performance.
- Test Methods: Includes recommended analytical techniques such as gas chromatography (GC), nuclear magnetic resonance (NMR), thermogravimetric analysis (TGA), high-performance liquid chromatography (HPLC), inductively coupled plasma mass spectrometry (ICP-MS), and ion chromatography (IC).
Applications
Atomic layer deposition is a cornerstone in the fabrication of advanced electronic and optical devices due to its ability to produce ultra-thin, conformal coatings with atomic-level thickness control. ISO 19383:2026 supports the following applications:
- Semiconductor Manufacturing: Ensures that ALD precursors meet strict purity and composition requirements essential for producing defect-free, high-performance semiconductor devices.
- Photovoltaics: Assists in the development of high-efficiency solar cells by regulating precursor quality for consistent thin film formation.
- Flexible Electronics & MEMS: Beneficial for industries requiring high uniformity and reproducibility in micro-electromechanical systems and flexible display technologies.
- Catalysis & Optoelectronics: Provides guidance for selecting suitable precursors to achieve precise film composition and quality in catalytic converters, LEDs, and sensing components.
- Research & Development: Offers a reference framework for academic and industrial research into new ALD chemistries and processes.
By establishing uniform criteria for precursor evaluation, the standard helps reduce variability across the ALD supply chain, supports qualification of new precursor grades, and facilitates international collaboration and product acceptance.
Related Standards
- ISO 8181 - Atomic layer deposition - Vocabulary: Provides terminology for the ALD field, supporting consistent communication across stakeholders.
- Related IPC and IEC standards: Cover electronic materials integrity, process chemistry, and purity analysis procedures relevant to nanotechnology and microelectronics.
- ISO/TC 107 Standards: The technical committee responsible for metallic and other inorganic coatings, offering additional guidance on coating technologies.
Using ISO 19383:2026 in conjunction with these related standards helps organizations maintain quality assurance, meet regulatory requirements, and accelerate innovation in precision thin film technologies.
Practical Value
Adhering to ISO 19383:2026 enables manufacturers, suppliers, and end-users of ALD precursors to:
- Achieve higher film quality and uniformity in deposited layers.
- Reduce defects and improve device reliability.
- Streamline procurement and quality control processes with internationally recognized specifications.
- Support the scalability of ALD processes in emerging applications and industries.
For further information and access to the full text, visit iso.org.