SIST EN ISO 18452:2016 PDF
Fine ceramics (advanced ceramics, advanced technical ceramics) - Determination of thickness of ceramic films by contact-probe profilometer (ISO 18452:2005)
Fine ceramics (advanced ceramics, advanced technical ceramics) - Determination of thickness of ceramic films by contact-probe profilometer (ISO 18452:2005)
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Количество страниц:
- 16
- Дата публикации:
- 17 мая 2016 г.
- ICS:
- 25.220.99
- Технический комитет:
- I13 - Imaginarni 13
ISO 18452:2005 specifies a method for the determination of the film thickness of a fine ceramic film and ceramic coatings by a contact-probe profilometer. The method is suitable for film thicknesses in the range of 10 nm to 10 000 nm.
Abstract
Overview
EN ISO 18452:2016 (ISO 18452:2005 adopted by CEN) defines a standardized method for measuring the thickness of fine ceramic films and ceramic coatings using a contact‑probe (stylus) profilometer. The procedure is intended for film thicknesses in the range 10 nm to 10 000 nm and is widely used for advanced/technical ceramics where a clear boundary between coated and uncoated substrate areas exists.
Key topics and technical requirements
- Measurement principle: film thickness is obtained from the profilometer trace across a step between coated and uncoated regions - scan direction C → B → A (down the step) and the thickness is the vertical difference at the inflection point.
- Instrument and calibration:
- Use a contact‑probe profilometer compliant with ISO 3274.
- Calibrate with step‑height calibration standards; calibration conditions should match measurement conditions.
- Contact probe (stylus):
- Diamond tip, conical shape; vertical angle typically 60° or 90°.
- Typical tip radii: 2 µm, 5 µm, 10 µm, 12.5 µm. Consider lateral broadening of step due to tip radius.
- Test pieces and preparation:
- Substrate with representative ceramic coating; clean (free of dust, oil, moisture).
- Step can be formed by masking during deposition or by etching away part of the film. Avoid masking artifacts near the step.
- Surface and roughness requirements:
- Ra of substrate and coating should be ≤ 1/5 of the step height.
- Average roughness wavelength should be
Технические детали
- SKU
- SIST EN ISO 18452:2016
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