ASTM F1894-98(2011)
Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)
Название (английский):
ASTM F1894-98(2011)
Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)
- Статус документа:
- Отменён
- Формат:
- Электронный (PDF)
- Дата публикации:
- 13 января 2020 г.
- SKU:
- ASTM F1894-98(2011)
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Abstract
Significance and UseThis test method can be used to ensure absolute reproducibility of WSix film deposition systems over the course of many months. The time span of measurements is essentially the life of many process deposition systems. Th...
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