Name: ASTM STP87019850041 — A Transmission Electron Microscopy Study of the Structure and Annealing Behavior of Copper-Krypton Deposits
SKU: ASTM STP87019850041

A combined implantation and sputtering method has been developed at Harwell to entrap high (5%) atomic concentrations of krypton in a metal matrix. The work has been aimed at providing a safe and effective method for storing the active kryp...

ASTM STP87019850041

Abstract

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