ISO 25164:2026 PDF
Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
- Статус документа:
- Действующий
- Формат:
- Электронный (PDF)
- Количество страниц:
- 6
- Дата публикации:
- 3 августа 2026 г.
- Издание:
- ISO IS 25164 edition 1 version 1
- ICS:
- 25.220.40
This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering. This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.
Abstract
Overview
ISO 25164:2026 – Physical vapor deposition coatings - Magnetron sputtering deposition of TiAlSiN thin films - Specification is an international standard developed by ISO. It details the technical requirements for depositing titanium aluminium silicon nitride (TiAlSiN) thin films using magnetron sputtering technology. The standard also extends its applicability to other coatings such as titanium nitride (TiN), titanium aluminium nitride (TiAlN), and titanium silicon nitride (TiSiN) thin films.
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